Method of manufacturing optical sensor

Details Method of manufacturing optical sensor Method of manufacturing optical sensor

2005-12-19

2009-08-11

Wojciechowicz, Edward (Department: 2895)

Semiconductor device manufacturing: process

Including control responsive to sensed condition

Optical characteristic sensed

C438S057000, C438S065000, C438S071000, C438S074000, C438S761000

Reexamination Certificate

active

07572648

ABSTRACT:
A cubic element of photonic crystal is integrally formed on the surface of a photo-detection element, and a portion of the photonic crystal cubic element is irradiated with ultraviolet rays thereby to change the refractive index of the portion of the cubic element that has been irradiated with ultraviolet rays. Alternatively, by causing globular particles having different refractive indices to eject on the surface of the photo-detection element from an ink-jet apparatus having a nozzle provided with a temperature control part by controlling temperature of the nozzle to form a laminate of globular particle layers having different refractive indices, a photonic crystal lens is integrally formed on the surface of the photo-detection element.

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Japanese Patent Office, Application No. JP 2003-346890, Notification of Reason(s) for Refusal, dated Mar. 4, 2008.

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