Photo-detector and related methods

Semiconductor device manufacturing: process – Making device or circuit responsive to nonelectrical signal

Reexamination Certificate

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Details

C438S065000, C438S066000, C257S232000, C257S233000, C257S292000, C257S432000, C257SE25032, C257SE31058, C257SE31076, C257SE33077, C338S015000

Reexamination Certificate

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07605013

ABSTRACT:
An apparatus comprising at least one multilayer wafer which includes a device layer adjacent to a barrier layer, and the device layer includes at least two photoconductive regions separated by an etched channel extending through the device layer. In some instances the apparatus may be an accelerometer having two photodiodes formed on a silicon-on-insulator (SOI) wafer with the photodiodes defined by one or more etched channels extending through the device layer of the SOI wafer. Also disclosed are methods for forming such an apparatus.

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Partial International Search Report from corresponding international application PCT/US2005/035909, Mailed Feb. 24, 2006.
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