Apparatus for producing high quality epitaxially grown semicondu

Details Apparatus for producing high quality epitaxially grown semicondu Apparatus for producing high quality epitaxially grown semicondu

1982-12-23

1987-10-13

Lovering, Richard D.

Coating apparatus

Gas or vapor deposition

With treating means

156611, 219426, 427252, 118728, B05C 914, F27B 1404

Patent

active

046990844

ABSTRACT:
A high pressure furnace and reusable demountable containment means for setive in situ information of epitaxial layers on a semiconductor substrate while under gas overpressure. The containment means has vent means therein for allowing the inert and reducing or reactive gases in an inner chamber of the furnace to enter into the interior of the containment means to equalize pressures on each side of the housing and to semi-confine the vapor from the epitaxial growth source materials in the interior of the containment means. The containment means has a removable, i.e. demountable, form-fittedly sealed plug which is removed to insert the substrate and growth source elements, which are mounted in a close-space relationship on a support structure, therein. The support structure is inserted back into the containment means and the plug is form fittedly sealed thereto for performing the epitaxial layering.

REFERENCES:
patent: 3357852 (1967-12-01), Ziegler
patent: 3406242 (1968-10-01), Lang
patent: 3494743 (1970-02-01), Baughman et al.
patent: 3749383 (1973-07-01), Voigt et al.
patent: 3984267 (1976-10-01), Craford et al.
patent: 4211182 (1980-07-01), Rosnowski

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