Radiant energy – Photocells; circuits and apparatus – Photocell controls its own optical systems
Reexamination Certificate
2007-02-12
2008-12-02
Luu, Thanh X (Department: 2878)
Radiant energy
Photocells; circuits and apparatus
Photocell controls its own optical systems
C355S053000, C355S077000
Reexamination Certificate
active
07459710
ABSTRACT:
To calibrate a lithographic apparatus having a programmable patterning means, a sensor, such as a CCD, CMOS sensor or photo-diode array, having detector elements larger than the size of a spot corresponding to a single pixel of the programmable patterning means is used. Pixels are selectively activated singly or in groups.
REFERENCES:
patent: 5229872 (1993-07-01), Mumola
patent: 5296891 (1994-03-01), Vogt et al.
patent: 5500736 (1996-03-01), Koitabashi et al.
patent: 5523193 (1996-06-01), Nelson
patent: 5530482 (1996-06-01), Gove et al.
patent: 5579147 (1996-11-01), Mori et al.
patent: 5617463 (1997-04-01), Beierlein
patent: 5677703 (1997-10-01), Bhuva et al.
patent: 5808797 (1998-09-01), Bloom et al.
patent: 5982553 (1999-11-01), Bloom et al.
patent: 6057538 (2000-05-01), Clarke
patent: 6121626 (2000-09-01), Lin
patent: 6133986 (2000-10-01), Johnson
patent: 6177980 (2001-01-01), Johnson
patent: 6486939 (2002-11-01), Lin
patent: 6687041 (2004-02-01), Sandstrom
patent: 6747783 (2004-06-01), Sandstrom
patent: 6795169 (2004-09-01), Tanaka et al.
patent: 6806897 (2004-10-01), Kataoka et al.
patent: 6811953 (2004-11-01), Hatada et al.
patent: 7183566 (2007-02-01), Baselmans et al.
patent: 7327389 (2008-02-01), Horimai et al.
patent: 2003/0081303 (2003-05-01), Sandstorm et al.
patent: 2004/0041104 (2004-03-01), Liebregts et al.
patent: 2004/0130561 (2004-07-01), Jain
patent: 2005/0006563 (2005-01-01), Baselmans et al.
patent: 2005/0007572 (2005-01-01), George et al.
patent: 1338184 (2002-02-01), None
patent: 3-264937 (1991-11-01), None
patent: 10-300631 (1998-11-01), None
patent: WO 98/33096 (1998-07-01), None
patent: WO 98/38597 (1998-09-01), None
patent: WO 03/046665 (2003-06-01), None
European Search Report for European App. 03253333.3 mailed Apr. 14, 2004.
Office Action, dated May 25, 2007, for JP Patent Application No. 2004-157038, 8 pgs.
Office Action and Translation of Office Action for Chinese Application No. 200410047658.4 issued Apr. 4, 2008, 16 pgs.
Baselmans Johannes Jacobus Matheus
Bleeker Arno Jan
ASML Netherlands B.V.
Legasse, Jr. Francis M.
Luu Thanh X
Sterne Kessler Goldstein & Fox P.L.L.C.
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