Optics: measuring and testing – Inspection of flaws or impurities – Surface condition
Reexamination Certificate
2005-03-30
2008-12-16
Chowdhury, Tarifur R. (Department: 2886)
Optics: measuring and testing
Inspection of flaws or impurities
Surface condition
Reexamination Certificate
active
07466405
ABSTRACT:
An image of an inspection object pattern formed on a photomask is acquired, which is to be transformed into inspection object pattern data as input data of light intensity distribution simulation for finding light intensity distribution in which optical conditions of an exposure system used in pattern transfer are reflected. The light intensity distribution simulation is performed using the inspection object pattern data, and a difference between light intensity distribution of the inspection object pattern obtained by the light intensity distribution simulation and reference light intensity distribution is found. Inverse light intensity distribution simulation having reversibility to the light intensity distribution simulation is performed using the difference, to obtain difference pattern data determining a defect in the inspection object pattern. Consequently, the presence/absence of the defect in the inspection object pattern can be determined highly accurately and defect location in the inspection object pattern can be identified easily and certainly.
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Akutagawa Satoshi
Takahashi Kazuhiko
Akanbi Isiaka O
Chowdhury Tarifur R.
Fujitsu Limited
Staas & Halsey , LLP
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