Photo resist stripper composition

Details Photo resist stripper composition Photo resist stripper composition

2005-04-19

2008-11-25

Webb, Gregory E (Department: 1796)

Cleaning compositions for solid surfaces, auxiliary compositions

Cleaning compositions or processes of preparing

For cleaning a specific substrate or removing a specific...

C510S176000, C510S407000, C510S506000

Reexamination Certificate

active

07456141

ABSTRACT:
A photo resist stripper composition includes PGME or its derivatives and ANONE or its derivatives characterized by low toxicity, safe use, free of odors, environment friendly, easy disposal of waste liquid and wastewater; good solution to photo resist material film, proper volatility, excellent stripping capability, good compatibility among different types of photo resist; allowing storage at ambient temperature, low production cost, and not requiring retrofit of the existing equipment.

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patent: 2004/0229762 (2004-11-01), Rutter, Jr.

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