Semiconductor device manufacturing: process – Including control responsive to sensed condition – Optical characteristic sensed
Reexamination Certificate
2004-06-02
2008-11-11
Estrada, Michelle (Department: 2823)
Semiconductor device manufacturing: process
Including control responsive to sensed condition
Optical characteristic sensed
C438S004000, C438S005000, C438S012000, C257SE21525, C257SE21527
Reexamination Certificate
active
07449348
ABSTRACT:
The present invention relates generally to photolithographic systems and methods, and more particularly to systems and methodologies that facilitate compensating for retrograde feature profiles on an imprint mask. An aspect of the invention generates feedback information that facilitates control of imprint mask feature profile via employing a scatterometry system to detect retrograde feature profiles, and mitigating the retrograde profiles via a spacer etchback procedure.
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Dakshina-Murthy Srikanteswara
Phan Khoi A.
Singh Bhanwar
Subramanian Ramkumar
Advanced Micro Devices , Inc.
Amin Turocy & Calvin LLP
Estrada Michelle
Stark Jarrett J
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