Polarimetric scatterometry methods for critical dimension...

Details Polarimetric scatterometry methods for critical dimension... Polarimetric scatterometry methods for critical dimension...

2007-09-21

2008-12-30

Geisel, Kara E (Department: 2877)

Optics: measuring and testing

By dispersed light spectroscopy

Utilizing a spectrometer

C356S445000, C356S237500

Reexamination Certificate

active

07471392

ABSTRACT:
An optical measurement system for evaluating a sample has a motor-driven rotating mechanism coupled to an azimuthally rotatable measurement head, allowing the optics to rotate with respect to the sample. A polarimetric scatterometer, having optics directing a polarized illumination beam at non-normal incidence onto a periodic structure on a sample, can measure optical properties of the periodic structure. An E-O modulator in the illumination path can modulate the polarization. The head optics collect light reflected from the periodic structure and feed that light to a spectrometer for measurement. A beamsplitter in the collection path can ensure both S and P polarization from the sample are separately measured. The measurement head can be mounted for rotation of the plane of incidence to different azimuthal directions relative to the periodic structures. The instrument can be integrated within a wafer process tool in which wafers may be provided at arbitrary orientation.

REFERENCES:
patent: 3858983 (1975-01-01), Foster et al.
patent: 4745526 (1988-05-01), Sestak
patent: 4933567 (1990-06-01), Silva et al.
patent: 5042951 (1991-08-01), Gold et al.
patent: 5329357 (1994-07-01), Bernoux et al.
patent: 5394247 (1995-02-01), Vahey et al.
patent: 5432607 (1995-07-01), Taubenblatt
patent: 5608526 (1997-03-01), Piwonka-Corle et al.
patent: 5640244 (1997-06-01), Hellstrom et al.
patent: 5726756 (1998-03-01), Aki et al.
patent: 5801824 (1998-09-01), Henley
patent: 5818061 (1998-10-01), Stern et al.
patent: 5867276 (1999-02-01), McNeil et al.
patent: 5910842 (1999-06-01), Piwonka-Corle et al.
patent: 5995218 (1999-11-01), Ide
patent: 6032071 (2000-02-01), Binder
patent: 6038026 (2000-03-01), Maris
patent: 6052191 (2000-04-01), Brayden, Jr. et al.
patent: 6184984 (2001-02-01), Lee et al.
patent: 6297880 (2001-10-01), Rosencwaig et al.
patent: 6359212 (2002-03-01), Hall et al.
patent: 6362881 (2002-03-01), Pickering et al.
patent: 6423977 (2002-07-01), Hayasaki et al.
patent: 6473186 (2002-10-01), Kawasaki et al.
patent: 6493064 (2002-12-01), Cabiri et al.
patent: 6507394 (2003-01-01), Cheng et al.
patent: 6539325 (2003-03-01), Numata et al.
patent: 6563586 (2003-05-01), Stanke et al.
patent: 6611330 (2003-08-01), Lee et al.
patent: 6721052 (2004-04-01), Zhao et al.
patent: 6842250 (2005-01-01), Schwarz
patent: 2001/0033378 (2001-10-01), Rosencwaig et al.
patent: 2002/0018217 (2002-02-01), Weber-Grabau et al.
patent: 2004/0207844 (2004-10-01), Nabatova-Gabain et al.
patent: 0 816 926 (1998-01-01), None
patent: 58034310 (1983-02-01), None
patent: 05060527 (1993-03-01), None
patent: 08190066 (1996-07-01), None
patent: 09138364 (1997-05-01), None
patent: 10300861 (1998-11-01), None
patent: 11295785 (1999-10-01), None
patent: 2001305071 (2001-10-01), None
patent: WO 99/02970 (1999-01-01), None
patent: WO 00/02037 (2000-01-01), None
“Automated Multiple Angle of Incidence Ellipsometer System,”IBM Technical Disclosure Bulletin, vol. 32, No. 9A, Feb. 1990, pp. 417-424.
“Automated, Remote, Programmable, Ellipsometer Drive Mechanism,”IBM Technical Disclosure Bulletin, vol. 31, No. 9, Feb. 1989, pp. 108-113.
S.A. Coulombe et al., “Ellipsometric-Scatterometry for sub-0.1 μm CD Measurements,”SPIE, vol. 3332, pp. 282-293. 2002.

Affiliated with

Also associated with

Rating

Polarimetric scatterometry methods for critical dimension... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Polarimetric scatterometry methods for critical dimension..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Polarimetric scatterometry methods for critical dimension... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4033778