Scatterometry target for determining CD and overlay

Details Scatterometry target for determining CD and overlay Scatterometry target for determining CD and overlay

2007-11-20

2008-11-11

Young, Christopher G (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Registration or layout process other than color proofing

C257S797000, C356S401000, C430S005000, C430S030000

Reexamination Certificate

active

07449265

ABSTRACT:
The invention can provide a method of processing a wafer using segmented multi-dimensional targets that can be used in Double-Patterning (D-P) procedures.

REFERENCES:
patent: 2004/0066517 (2004-04-01), Huang et al.
patent: 2004/0137651 (2004-07-01), Smedt et al.
patent: 2004/0218179 (2004-11-01), Norton et al.
patent: 2004/0246482 (2004-12-01), Sezginer et al.
patent: 2005/0012928 (2005-01-01), Sezginer et al.
patent: 2005/0018190 (2005-01-01), Sezginer et al.
patent: 2005/0089773 (2005-04-01), Shur et al.
patent: 2005/0122516 (2005-06-01), Sezginer et al.
patent: 2005/0174575 (2005-08-01), Norton et al.
patent: 2005/0231732 (2005-10-01), Monshouwer et al.
patent: 2005/0286051 (2005-12-01), Sezginer et al.
patent: 2006/0073686 (2006-04-01), Zach et al.
patent: 2006/0082792 (2006-04-01), Sezginer

Affiliated with

Also associated with

Rating

Scatterometry target for determining CD and overlay does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Scatterometry target for determining CD and overlay, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Scatterometry target for determining CD and overlay will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4031569