Method and system for making a nano-plate for imprint...

Details Method and system for making a nano-plate for imprint... Method and system for making a nano-plate for imprint...

2004-12-16

2008-08-12

Culbert, Roberts (Department: 1792)

Etching a substrate: processes

Forming or treating optical article

C216S011000, C264S001330

Reexamination Certificate

active

07410591

ABSTRACT:
Provided is a method and system for manufacturing a nano-plate. The method includes depositing two or more types of film around a central core to form a plurality of film layers, each film layer being of a different type than its adjacent layers. Next, the deposited film layers are sectioned to expose a patterned surface. Finally, the patterned surface is then planarized and selectively etched to form a relief pattern which can be used as an imprint stamp.

REFERENCES:
patent: 5669303 (1997-09-01), Maracas et al.
patent: 5772905 (1998-06-01), Chou
patent: 6238271 (2001-05-01), Cesna
patent: 6365059 (2002-04-01), Pechenik
patent: 6399173 (2002-06-01), Nagayama et al.
patent: 6482742 (2002-11-01), Chou
patent: 6507456 (2003-01-01), Dinan et al.
patent: 6518189 (2003-02-01), Chou
patent: 6531202 (2003-03-01), Khizroev et al.
patent: 6601629 (2003-08-01), Betsui et al.
patent: 6656021 (2003-12-01), Ota et al.
patent: 6740209 (2004-05-01), Shibamoto et al.
patent: 6743368 (2004-06-01), Lee
patent: 6757116 (2004-06-01), Curtiss et al.
patent: 6809356 (2004-10-01), Chou
patent: 6814898 (2004-11-01), Deeman et al.
patent: 6869557 (2005-03-01), Wago et al.
patent: 6951173 (2005-10-01), Meissl et al.
patent: 6964793 (2005-11-01), Willson et al.
patent: 2002/0114978 (2002-08-01), Chang et al.
patent: 2003/0017424 (2003-01-01), Park et al.
patent: 2003/0091865 (2003-05-01), Chen et al.
patent: 2003/0104316 (2003-06-01), Wang et al.
patent: 2003/0127007 (2003-07-01), Sakurai et al.
patent: 2003/0203319 (2003-10-01), Lee
patent: 2004/0090610 (2004-05-01), Hatakeyama et al.
patent: 2004/0101713 (2004-05-01), Wachenschwanz et al.
patent: 2004/0124566 (2004-07-01), Sreenivasan et al.
patent: 2004/0132301 (2004-07-01), Harper et al.
patent: 2004/0146792 (2004-07-01), Nimmakayala et al.
patent: 2004/0169441 (2004-09-01), Choi et al.
patent: 2004/0182620 (2004-09-01), Motowaki et al.
patent: 2004/0195202 (2004-10-01), Pechenik
patent: 2004/0197712 (2004-10-01), Jacobson et al.
patent: 2004/0202865 (2004-10-01), Homola et al.
patent: 2004/0209123 (2004-10-01), Bajorek et al.
patent: 2004/0211755 (2004-10-01), Yusa et al.
patent: 2005/0116370 (2005-06-01), Ogino et al.
patent: 2005/0118817 (2005-06-01), Fujita et al.
patent: 2005/0130074 (2005-06-01), Krause et al.
patent: 2005/0133954 (2005-06-01), Homola
patent: 2005/0146078 (2005-06-01), Chou et al.
patent: 2005/0150862 (2005-07-01), Harper et al.
patent: 2005/0151282 (2005-07-01), Harper et al.
patent: 2005/0151300 (2005-07-01), Harper et al.
patent: 2005/0155554 (2005-07-01), Saito
patent: 2005/0156342 (2005-07-01), Harper et al.
patent: 2005/0158163 (2005-07-01), Harper et al.
patent: 2005/0167847 (2005-08-01), Olsson
patent: 2005/0172848 (2005-08-01), Olsson
patent: 2005/0191418 (2005-09-01), Bietsch et al.
patent: 2005/0212178 (2005-09-01), Nien et al.
patent: 2006/0130317 (2006-06-01), Sewell
patent: 2006/0130678 (2006-06-01), Sewell
patent: 2006/0131785 (2006-06-01), Sewell
patent: 2007/0121375 (2007-05-01), Sewell
patent: 0 617 457 (1994-09-01), None
patent: 1 072 954 (2001-01-01), None
patent: WO 01/59523 (2001-08-01), None
patent: WO 02/42844 A2 (2002-05-01), None
patent: WO 02/091460 (2002-11-01), None
patent: WO 02/091460 A2 (2002-11-01), None
patent: WO 2091460 (2002-11-01), None
patent: WO 03/099463 A2 (2003-12-01), None
patent: WO 2004/013697 A2 (2004-02-01), None
patent: WO 2004/021083 (2004-03-01), None
patent: WO 2004/099879 (2004-11-01), None
Harry Sewell, U.S. Patent Appl. No. 11/288,135, filed Nov. 29, 2005, entitled “System and Method for Forming Nanodisks Used in Imprint Lithography and Nanodisk and Memory Disk Formed Thereby”.
Requirement for Restriction/Election for U.S. Appl. No. 11/012,474, mailed on Jul. 6, 2007.
Non-Final Rejection for U.S. Appl. No. 11/012,598, mailed on Feb. 24, 2006.
Second Final Rejection for U.S. Appl. No. 11/012,598, mailed on Sep. 11, 2007.
Second Non-Final Rejection for U.S. Appl. No. 11/012,598, mailed on Mar. 27, 2007.
First Final Rejection for U.S. Appl. No. 11/012,598, mailed Sep. 21, 2006.
Non-Final Rejection for U.S. Appl. No. 11/224,316, mailed Jul. 3, 2007.
International Search Report and Written Opinion for International Appl. No. PCT/US05/45458 mailed Sep. 4, 2007, 8 pages.
Notice of Allowability for U.S. Appl. No. 11/288,135, mailed Aug. 6, 2007.
Notice of Allowability for U.S. Appl. No. 11/012,598, mailed Nov. 28, 2007.
Notice of Allowability for U.S. Appl. No. 11/224,316, mailed Jan. 2, 2008.
Second Notice of Allowability for U.S. Appl. No. 11/288,135, mailed Dec. 5, 2007.

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