Method for manufacturing a filter substrate, inkjet...

Details Method for manufacturing a filter substrate, inkjet... Method for manufacturing a filter substrate, inkjet...

2005-10-31

2008-08-26

Vo, Anh T. N. (Department: 2861)

Incremental printing of symbolic information

Ink jet

Ejector mechanism

Reexamination Certificate

active

07416285

ABSTRACT:
A filter capable of separating or filtering micro foreign particles in a flow passage is provided. A first mask and a second mask are formed on a silicon substrate by dry etching. Before performing the dry etching, a resist of the first mask is subjected to a heat treatment performed at a temperature equal to or higher than a glass transition point. A resist of the second mask is not subjected to such a heat treatment. This processing simultaneously forms in the substrate a groove portion and a wall having a hole that is located in the groove portion. A silicon material located beneath a wide portion of the first mask remains as a wall portion separating the holes.

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patent: 6-286149 (1994-10-01), None
patent: 10-34928 (1998-02-01), None
patent: 10-95119 (1998-04-01), None

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