Method of measuring the position of a mask surface along the...

Details Method of measuring the position of a mask surface along the... Method of measuring the position of a mask surface along the...

2005-12-21

2008-10-07

Rutledge, Della J. (Department: 2851)

Photocopying

Projection printing and copying cameras

Step and repeat

C378S034000

Reexamination Certificate

active

07433017

ABSTRACT:
A method to measure the height-direction position of a mask M in an exposure device having a function to irradiate the mask M with light emitted from a light source and transfer a pattern formed on the mask M onto a photosensitive substrate such as a wafer by a projection optical system, a mask surface height-direction position measurement method characterized by moving, before measuring the height-direction position of the mask M, an exposure area defining member1which is arranged between the mask M and the projection optical system and defines an exposure area at the time of exposure.

REFERENCES:
patent: 5502311 (1996-03-01), Imai et al.
patent: 5633721 (1997-05-01), Mizutani
patent: 5801835 (1998-09-01), Mizutani
patent: 6452661 (2002-09-01), Komatsuda
patent: 6526118 (2003-02-01), Komatsuda et al.
patent: 6727980 (2004-04-01), Ota et al.
patent: 2005/0052633 (2005-03-01), Mori et al.

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