Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – From silicon reactant having at least one...
Reexamination Certificate
2005-06-09
2008-08-26
Zimmer, Marc S (Department: 1796)
Synthetic resins or natural rubbers -- part of the class 520 ser
Synthetic resins
From silicon reactant having at least one...
C528S027000, C528S029000, C528S043000
Reexamination Certificate
active
07417104
ABSTRACT:
A porous film-forming composition is provided comprising (A) a polymer obtained by hydrolytic condensation of a hydrolyzable silane having formula (1):in-line-formulae description="In-line Formulae" end="lead"?R1n—Si—R24-n (1)in-line-formulae description="In-line Formulae" end="tail"?wherein R1is a monovalent organic group or hydrogen, R2is a hydrolyzable group or a hydroxyl group and n is an integer of 0 to 3, a hydrolyzate thereof or a partial condensate thereof, with the proviso that at least one silicon compound having an organic crosslinkable group as R1is included, the polymer being capable of crosslinking reaction by the organic crosslinkable group, and (B) an organic solvent. The composition has improved storage stability, filling properties, adhesion and coating uniformity sufficient to form a sacrificial film which is dissolvable in a stripping solution.
REFERENCES:
patent: 5100503 (1992-03-01), Allman et al.
patent: 5324550 (1994-06-01), Yamaguchi et al.
patent: 5457003 (1995-10-01), Tanaka et al.
patent: 6025117 (2000-02-01), Nakano et al.
patent: 6268457 (2001-07-01), Kennedy et al.
patent: 6420088 (2002-07-01), Angelopoulos et al.
patent: 6495264 (2002-12-01), Hayashi et al.
patent: 6506497 (2003-01-01), Kennedy et al.
patent: 6515073 (2003-02-01), Sakamoto et al.
patent: 6576393 (2003-06-01), Sugita et al.
patent: 2002/0020327 (2002-02-01), Hayashi et al.
patent: 2002/0195419 (2002-12-01), Pavelchek
patent: 2003/0091838 (2003-05-01), Hayashi et al.
patent: 2003/0104225 (2003-06-01), Shiota et al.
patent: 2003/0198877 (2003-10-01), Pfeiffer et al.
patent: 2003/0209515 (2003-11-01), Pavelchek
patent: 2004/0191479 (2004-09-01), Hatakeyama et al.
patent: 2004/0247900 (2004-12-01), Ogihara et al.
patent: 2004/0253461 (2004-12-01), Ogihara et al.
patent: 63-138353 (1988-06-01), None
patent: 5-27444 (1993-02-01), None
patent: 6-138664 (1994-05-01), None
patent: 7-69611 (1995-03-01), None
patent: 10-69072 (1998-03-01), None
patent: 11-60735 (1999-03-01), None
patent: 3118887 (2000-10-01), None
patent: 2000-356854 (2000-12-01), None
patent: 2001-53068 (2001-02-01), None
patent: 2001-92122 (2001-04-01), None
patent: 2001-343752 (2001-12-01), None
patent: 2001-354904 (2001-12-01), None
patent: 2003-502449 (2003-01-01), None
patent: 2003-157807 (2003-05-01), None
patent: 2005-18054 (2005-01-01), None
patent: WO-00/77575 (2000-12-01), None
Lynch et al., Proc SPIE vol. 2195, 1994, pp. 225-229.
Lin et al., Proc. SPIE vol. 3678, 1999, pp. 241-250.
Asano Takeshi
Hamada Yoshitaka
Iwabuchi Motoaki
Ogihara Tsutomu
Ueda Takafumi
Birch & Stewart Kolasch & Birch, LLP
Shin-Etsu Chemical Co. , Ltd.
Zimmer Marc S
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