Method for measuring line and space pattern using scanning...

Details Method for measuring line and space pattern using scanning... Method for measuring line and space pattern using scanning...

2004-12-22

2008-10-07

Ishrat, Sherali (Department: 2624)

Image analysis

Image transformation or preprocessing

Measuring image properties

Reexamination Certificate

active

07433542

ABSTRACT:
The present invention is relates to a method for measuring average line width of line and space patterns in a simplified manner and at high speed without measuring at many positions. An average line width, an average space width, and an average pitch width are calculated from peak intervals of auto-correlation values of a differentiated image of the line and space patterns or peak patterns corresponding to line edges on projection data of the differentiated image.

REFERENCES:
patent: 6258610 (2001-07-01), Blatchford et al.
patent: 7095884 (2006-08-01), Yamaguchi et al.
patent: 2002/0034338 (2002-03-01), Askary
patent: 2002/0149783 (2002-10-01), Rotsch
patent: 2003/0021463 (2003-01-01), Yamaguchi et al.
patent: 57-187604 (1982-11-01), None
patent: 02-190708 (1990-07-01), None
patent: 2002-243428 (2002-08-01), None
patent: 2003-037139 (2003-02-01), None
Japanese Office Action with Partial English Translation, issued in corresponding Japanese Patent Application No. JP 2003-435519, mailed on Nov. 6, 2007.

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