Immersion lithography method and device for illuminating a...

Details Immersion lithography method and device for illuminating a... Immersion lithography method and device for illuminating a...

2006-03-22

2008-09-02

Nguyen, Hung Henry (Department: 2851)

Photocopying

Projection printing and copying cameras

Step and repeat

C355S055000

Reexamination Certificate

active

07420652

ABSTRACT:
The invention relates to an immersion lithography method which illuminates a substrate positioned on a carrier. When a substrate is illuminated, an immersion fluid is introduced between a reproducing element and the substrate and the field depth or the resolution, or both, are adjusted by varying the distance in the direction of the beam between an illuminating reticule and the surface of the substrate along a direction of movement of the carrier.

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