Method and apparatus for film deposition

Details Method and apparatus for film deposition Method and apparatus for film deposition

2002-02-20

2008-10-07

Mulpuri, Savitri (Department: 2812)

Semiconductor device manufacturing: process

Making device or circuit emissive of nonelectrical signal

C438S479000

Reexamination Certificate

active

07432116

ABSTRACT:
Provided is a method and apparatus for depositing an organic compound layer having a plurality of function regions. A plurality of evaporation sources are provided within a deposition chamber. Function regions of respective organic compounds can be continuously formed and a mixed region be formed in an interface between the function regions. Meanwhile, a light source is provided in a deposition chamber to perform deposition while irradiating light to an anode surface, thereby forming a compact organic compound layer.

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