Harsh environment gas sensor apparatus and method

Chemistry: analytical and immunological testing – Including sample preparation – Liberation or purification of sample or separation of...

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

Reexamination Certificate

active

07422909

ABSTRACT:
Provided is an apparatus for gas sampling from a harsh environment which comprises a chemically resistant plastic housing suitable for suspension in a confined spacial environment. The housing has apertures for inlet and outlet tubes by which sampled air is drawn into and then discharged from the housing. Included are two three way valves to control selective fluid communication with the environment, a gas sensor, a filter selectively remove contamination from the housing and prevent saturation of the gas sensor, a pump disposed within the housing to effect selective fluid flow through the gas sensor and filter, and a power source that is preferably batteries.The apparatus electronics are all integrated into an electronics module configured so as to communicate with an external readout in a remote location via several methods. Sampling data is accumulated by a data logger which includes the capacity to retain such information as date and time of sampling, concentration of each sample, and the unit's identification data. The electronics module is in electrical communication with the power source. Power is also supplied to the pump and valves that control the admission of sample gas, direction of it to the sensor, discharge of gas to the harsh environment, and filtration of all the atmosphere within the housing to (1) flush the sensor and (2) clear contamination from the interior of the housing.

REFERENCES:
patent: 4664886 (1987-05-01), Novack et al.
patent: 5010021 (1991-04-01), Bell et al.
patent: 5155357 (1992-10-01), Hemond
patent: 5226314 (1993-07-01), Baret
patent: 5425268 (1995-06-01), Li et al.
patent: 5525799 (1996-06-01), Andresen et al.
patent: 5980832 (1999-11-01), Andresen et al.
patent: 5981289 (1999-11-01), Wright et al.
patent: D432037 (2000-10-01), Worth et al.
patent: 6198400 (2001-03-01), Church et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Harsh environment gas sensor apparatus and method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Harsh environment gas sensor apparatus and method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Harsh environment gas sensor apparatus and method will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3986039

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.