Variable mask device for crystallizing silicon layer

Active solid-state devices (e.g. – transistors – solid-state diode – Regenerative type switching device – With extended latchup current level

Reexamination Certificate

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Details

C257S726000, C438S795000, C359S368000

Reexamination Certificate

active

07429760

ABSTRACT:
Disclosed are a variable mask device for crystallizing a silicon layer capable of controlling a width and a length of an opening, and a method for crystallizing a silicon using the variable mask device. The variable mask device has a frame with an opening whose width is controlled by an X direction actuator and whose length is controlled by a Y direction actuator. A substrate on which a plurality of unit liquid crystal display panels are formed is provided. A laser beam is aligned through the opening and the silicon layer formed on the substrate is irradiated with the laser beam, thereby crystallizing the silicon layer. The substrate is moved in an X direction by scanning distance and the silicon layer is irradiated until the silicon layer is entirely crystallized.

REFERENCES:
patent: 3736425 (1973-05-01), Chernow
patent: 4338654 (1982-07-01), Logothetis
patent: 4468720 (1984-08-01), Arai
patent: 5347134 (1994-09-01), Hashimoto et al.
patent: 5523574 (1996-06-01), Hamada et al.
patent: 5744859 (1998-04-01), Ouchida
patent: 6891671 (2005-05-01), Greenberg
patent: 2001/0000243 (2001-04-01), Sugano et al.
patent: 2003/0184722 (2003-10-01), Kyusho et al.
patent: 2003/0211714 (2003-11-01), Yamazaki et al.
patent: 2003/0228723 (2003-12-01), Yamazaki et al.
patent: 2004/0072411 (2004-04-01), Azami et al.
patent: 1514469 (2004-07-01), None
patent: 1326273 (2003-07-01), None
patent: 58-138588 (1983-08-01), None
patent: 200208769 (2000-07-01), None
patent: 2002-237455 (2002-08-01), None
patent: 2004-88084 (2004-03-01), None
patent: 2000-0076463 (2000-12-01), None
Office Action dated Mar. 31, 2006 for corresponding Korean Application No. 10-2004-0062892.
Office Action dated Jul. 4, 2006 from the Taiwanese Patent Office for corresponding application No. 094121631.
Search and Examination Report dated Feb. 1, 2007 for corresponding British Patent Application No. 0624768.8.
Office Action for corresponding Chinese Patent Application Serial No. 200510079644.5 dated Jun. 8, 2007.

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