Method for forming photomask having test patterns in blading...

Details Method for forming photomask having test patterns in blading... Method for forming photomask having test patterns in blading...

2005-04-05

2008-05-27

Geyer, Scott B. (Department: 2812)

Semiconductor device manufacturing: process

With measuring or testing

C438S011000, C438S016000, C257SE21023

Reexamination Certificate

active

07378289

ABSTRACT:
A photomask and a method for forming a photomask are disclosed in which die regions that define features for a process step of a semiconductor fabrication process are formed on a photomask and a test pattern for a different process step is formed in a blading area of the photomask. Also, a method for forming test structures is disclosed in which the photomask is exposed to transfer the test pattern to a semiconductor substrate. The process step that is associated with the test pattern is then performed, forming a test structure on the semiconductor substrate. By utilizing blading areas of photomasks and including test patterns for different process steps on the same photomask, more test structures can be obtained, without the need to generate additional photomasks for testing purposes.

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