Methods of forming nanoparticle based monolayer films with...

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Reexamination Certificate

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C428S401000, C428S447000, C428S448000, C428S548000, C428S553000, C428S559000

Reexamination Certificate

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07344773

ABSTRACT:
The present invention provides methods of forming uniform nanoparticle based monolayer films with a high particle density on the surface of a substrate comprising (a) forming a surface modifying layer on a substrate using a material comprising a first functional group that chemically binds to the substrate and a second functional group comprising a group capable of forming van der Waals forces, (b) applying to the surface modifying layer a solution comprising nanoparticles, and (c) curing the resultant structure formed at step (b) for a predetermined time to form a nanoparticle based monolayer film. The present invention further provides substrates and devices comprising the nanoparticle based monolayer films.

REFERENCES:
patent: 6410149 (2002-06-01), Hendricks et al.
patent: 2004/0071924 (2004-04-01), Yang et al.
patent: 2004/0203256 (2004-10-01), Yang et al.
patent: 2003-147417 (2003-05-01), None
patent: 2005-92939 (2005-04-01), None
patent: 10-2003-0083913 (2003-11-01), None
Hong et al. “Controlled two-dimensional distribution of nanoparticles by spin-coating method”Applied Physics Letters80(5):844-846 (2002).
Kodama et al. “Disk substrate deposition techniques for monodisperse chemically synthesized FePt nanoparticle media”Applied Physics Letters83(25):5253-5255 (2003).

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