Pre-aligning a substrate in a lithographic apparatus, device...

Details Pre-aligning a substrate in a lithographic apparatus, device... Pre-aligning a substrate in a lithographic apparatus, device...

2005-06-20

2008-03-11

Nguyen, Henry Hung (Department: 2851)

Photocopying

Projection printing and copying cameras

Focus or magnification control

C355S053000

Reexamination Certificate

active

07342642

ABSTRACT:
A method of pre-aligning a substrate in a lithographic apparatus is described. The substrate has at least one alignment mark provided on a side of the substrate. The method includes determining a relationship between a position of the at least one alignment mark, at least part of an edge of the substrate, and a center of the substrate. A substrate support is provided to support a substrate, the substrate support having at least one optical view window at a predetermined location to view a part of the side of the substrate. The substrate is placed on the substrate support on the basis of the relationship to position the at least one alignment mark in the at least one optical view window.

REFERENCES:
patent: 5929976 (1999-07-01), Shibuya et al.
patent: 6052173 (2000-04-01), Miura et al.
patent: 6549648 (2003-04-01), Rinn
patent: 6768539 (2004-07-01), Gui et al.
patent: 7075621 (2006-07-01), Mitsui et al.
patent: 2002/0109825 (2002-08-01), Gui et al.

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