Method of forming fine particle array on substrate and...

Details Method of forming fine particle array on substrate and... Method of forming fine particle array on substrate and...

2005-11-23

2008-09-02

Wyszomierski, George (Department: 1793)

Specialized metallurgical processes, compositions for use therei

Processes

Producing or purifying free metal powder or producing or...

C075S369000, C423S592100

Reexamination Certificate

active

07419529

ABSTRACT:
An object of the present invention is to provide a method of forming fine particles on a substrate in which reoxidization of reduced fine particles is suppressed. Reduced fine particles (FeO fine particles) are formed by embedding metal oxide fine particles (Fe2O3fine particles) fixed on a p type silicon semiconductor substrate into a silicon oxidized film, and carrying out a heat treatment in a reducing gas atmosphere. Presence of the silicon oxidized film enables suppression of reoxidization of the reduced fine particles (FeO fine particles) due to exposure to the ambient air.

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patent: 6121075 (2000-09-01), Yamashita
patent: 6303516 (2001-10-01), Morita et al.
patent: 7015139 (2006-03-01), Yamashita
patent: 2004/0028694 (2004-02-01), Young et al.
patent: 2002-223016 (2002-08-01), None
patent: 2005-118963 (2005-05-01), None

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