Method for preparing chemical adsorption film and solution...

Metal treatment – Process of modifying or maintaining internal physical... – Processes of coating utilizing a reactive composition which...

Reexamination Certificate

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C424S428000, C206S006100

Reexamination Certificate

active

07422642

ABSTRACT:
To provide a method which allows the combination of rapid formation of a chemical adsorption film with the preparation of the film which is reduced in the content of impurities and having a dense structure. A method for preparing a chemical adsorption film on the surface of a substrate containing an active hydrogen, characterized in that it includes treating a metal based surfactant having at least one hydrolyzable group with a metal oxide or a partially hydrolyzed product from a metal alkoxide and water in an organic solvent to form a solution, and contacting the solution with the surface of the substrate.

REFERENCES:
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patent: 9-208438 (1997-08-01), None
patent: 9-278490 (1997-10-01), None
patent: 2000-053421 (2000-02-01), None
Patent Abstracts of Japan for JP04-132637 published on May 6, 1992.
Patent Abstracts of Japan for JP04-221630 published on Aug. 12, 1992.
Patent Abstracts of Japan for JP04-367721 published on Dec. 21, 1992.
Patent Abstracts of Japan for JP08-337654 published on Dec. 24, 1996.
Patent Abstracts of Japan for JP09-208438 published on Aug. 12, 1997.
Patent Abstracts of Japan for JP2000-053421 published on Feb. 22, 2000.
Certified translation of Japanese Patent Publication No. 08-012375 (Previously Cited in this application).

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