LPP EUV drive laser input system

Radiant energy – Radiant energy generation and sources

Reexamination Certificate

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C250S50400H, C250S496100, C250S503100, C362S263000, C362S266000

Reexamination Certificate

active

07402825

ABSTRACT:
A laser produced plasma (“LPP”) extreme ultraviolet (“EUV”) light source and method of operating same is disclosed which may comprise an EUV plasma production chamber having a chamber wall; a drive laser entrance window in the chamber wall; a drive laser entrance enclosure intermediate the entrance window and a plasma initiation site within the chamber and comprising an entrance enclosure distal end opening; at least one aperture plate intermediate the distal opening and the entrance window comprising at least one drive laser passage aperture. The at least one aperture plate may comprise at least two aperture plates comprising a first aperture plate and a second aperture plate defining an aperture plate interim space. The at least one drive laser aperture passage may comprise at least two drive laser aperture passages. The laser passage aperture may define an opening large enough to let the drive laser beam pass without attenuation and small enough to substantially reduce debris passing through the laser passage aperture in the direction of the entrance window.

REFERENCES:
patent: 2759106 (1956-08-01), Wolter
patent: 3150483 (1964-09-01), Mayfield et al.
patent: 3232046 (1966-02-01), Meyer
patent: 3279176 (1966-10-01), Boden
patent: 3746870 (1973-07-01), Demarest
patent: 3960473 (1976-06-01), Harris
patent: 3961197 (1976-06-01), Dawson
patent: 3969628 (1976-07-01), Roberts et al.
patent: 4042848 (1977-08-01), Lee
patent: 4088966 (1978-05-01), Samis
patent: 4143275 (1979-03-01), Mallozzi et al.
patent: 4162160 (1979-07-01), Witter
patent: 4203393 (1980-05-01), Giardini
patent: 4364342 (1982-12-01), Asik
patent: 4369758 (1983-01-01), Endo
patent: 4504964 (1985-03-01), Cartz et al.
patent: 4507588 (1985-03-01), Asmussen et al.
patent: 4536884 (1985-08-01), Weiss et al.
patent: 4538291 (1985-08-01), Iwamatsu
patent: 4561406 (1985-12-01), Ward
patent: 4596030 (1986-06-01), Herziger et al.
patent: 4618971 (1986-10-01), Weiss et al.
patent: 4626193 (1986-12-01), Gann
patent: 4633492 (1986-12-01), Weiss et al.
patent: 4635282 (1987-01-01), Okada et al.
patent: 4751723 (1988-06-01), Gupta et al.
patent: 4752946 (1988-06-01), Gupta et al.
patent: 4774914 (1988-10-01), Ward
patent: 4837794 (1989-06-01), Riordan et al.
patent: 4928020 (1990-05-01), Birx et al.
patent: 5023897 (1991-06-01), Neff et al.
patent: 5027076 (1991-06-01), Horsley et al.
patent: 5102776 (1992-04-01), Hammer et al.
patent: 5126638 (1992-06-01), Dethlefsen
patent: 5142166 (1992-08-01), Birx
patent: 5175755 (1992-12-01), Kumakhov
patent: 5313481 (1994-05-01), Cook et al.
patent: 5319695 (1994-06-01), Itoh et al.
patent: RE34806 (1994-12-01), Cann
patent: 5411224 (1995-05-01), Dearman et al.
patent: 5448580 (1995-09-01), Birx et al.
patent: 5504795 (1996-04-01), McGeoch
patent: 5729562 (1998-03-01), Birx et al.
patent: 5763930 (1998-06-01), Partlo
patent: 5866871 (1999-02-01), Birx
patent: 5936988 (1999-08-01), Partlo et al.
patent: 5963616 (1999-10-01), Silfvast et al.
patent: 5970076 (1999-10-01), Hamada
patent: 6031241 (2000-02-01), Silfvast et al.
patent: 6031598 (2000-02-01), Tichenor et al.
patent: 6039850 (2000-03-01), Schulz
patent: 6051841 (2000-04-01), Partlo
patent: 6064072 (2000-05-01), Partlo et al.
patent: 6172324 (2001-01-01), Birx
patent: 6195272 (2001-02-01), Pascente
patent: 6285743 (2001-09-01), Kondo et al.
patent: 6307913 (2001-10-01), Foster et al.
patent: 6317448 (2001-11-01), Das et al.
patent: 6377651 (2002-04-01), Rihcardson et al.
patent: 6396900 (2002-05-01), Barbee, Jr. et al.
patent: 6452194 (2002-09-01), Bijkerk et al.
patent: 6452199 (2002-09-01), Partlo et al.
patent: 6493323 (2002-12-01), Bisschops
patent: 6566667 (2003-05-01), Partlo et al.
patent: 6566668 (2003-05-01), Rauch et al.
patent: 6576912 (2003-06-01), Visser et al.
patent: 6580517 (2003-06-01), Lokai et al.
patent: 6586757 (2003-07-01), Melnychuk et al.
patent: 6590959 (2003-07-01), Kandaka et al.
patent: 6647086 (2003-11-01), Amemiya et al.
patent: 6744060 (2004-06-01), Ness et al.
patent: 6804327 (2004-10-01), Schriever et al.
patent: 6815700 (2004-11-01), Melnychuk et al.
patent: 6865255 (2005-03-01), Richardson
patent: 7057190 (2006-06-01), Bakker et al.
patent: 7091507 (2006-08-01), Masaki et al.
patent: 2002/0090054 (2002-07-01), Sogard
patent: 2003/0068012 (2003-04-01), Ahmad et al.
patent: 2003/0219056 (2003-11-01), Yager et al.
patent: 2004/0184014 (2004-09-01), Bakker et al.
patent: 2006/0138354 (2006-06-01), Bakker et al.
patent: 2000091096 (2000-03-01), None
Andreev et al., “Enhancement of laser/EUV conversion by shaped laser pulse interacting with Li-contained targets for EUV lithography,” Proc. of SPIE, 5196:128-136 (2004).
Apruzese, “X-ray laser research using Z pinches,” Am. Inst. of Phys. 399-403 (1994).
Bollanti et al., “Compact three electrodes excimer laser IANUS for a POPA optical system,” SPIE Proc. (2206) 144-153 (1994).
Bollanti et al., “Ianus the three-electrode excimer laser,” App. Phys. B (lasers & Optics) 66(4):401-406 (1998).
Braun et al., “Multi-component EUV multiplayer mirrors,” Proc. SPIE, 5037:2-13 (2003).
Choi et al., “Fast pulsed hollow cathode capillary discharge device,” Rev. of Sci. Instrum. 69(9):3118-3122 (1998).
Choi et al., “Temporal development of hard and soft x-ray emission from a gas-puff Z pinch,” Rev. Sci. Instrum. 57(8), pp. 2162-2164 (Aug. 1986).
Eichler et al., “Phase conjugation for realizing lasers with diffraction limited beam quality and high average power,” Techninische Universitat Berlin, Optisches Institut (Jun. (1998).
R. Fedosejevs et al., “Subnanosecond pulses from a KrF laser pumped SF6Brillouin amplifier”, IEEE J. QE 21, 1558-1562 (1985).
Feigl et al., “Heat resistance of EUV multiplayer mirrors for long-time applications,” Microelectric Engineering, 57-58:3-8 (2001).
Fomenkov et al., “Characterization of a 13.5 nm source for EUV lithography based on a dense plasma focus and lithium emission,” Sematech Intl. Workshop on EUV Lithography (Oct. 1999).
Giordano et al., “Magnetic pulse compressor for prepulse discharge in spiker sustainer excitati technique for XeC1 lasers,” Rev. Sci. Instrum. 65(8), pp. 2475-2481 (Aug. 1994).
Hansson et al., “Xenon liquid jet laser-plasma source for EUV lithography,” Emerging Lithographic Technologies IV, Proc. of SPIE, vol. 3997:729-732 (2000).
Jahn, Physics of Electric Propulsion, McGraw-Hill Book Company, (Series in Missile and Space USA), Chap. 9, “Unsteady Electromagnetic Acceleration,” p. 257 (1968).
Jiang et al., “Compact multimode pumped erbium-doped phosphate fiber amplifers,” Optical Engineering, vol. 42, Issue 10, pp. 2817-2820 (Oct. 2003).
Kato, “Electrode lifetimes in a plasma focus soft x-ray source,” J. Appl. Phys. (33) Pt. 1, No. 8:4742-4744 (1991).
Kato et al., “Plasma focus x-ray source for lithography,” Am. Vac. Sci. Tech. B. 6(1): 195-198 (1988).
Kuwahara et al., “Short-pulse generation by saturated KrF laser amplification of a steep stokes pulse produced by two-step stimulated brillouin scattering”, J. Opt. Soc. Am. B 17, 1943-1947 (2000).
Lange et al., “High gain coefficient phosphate glass fiber amplifier,” NFOEC 2003, paper No. 126.
Lebert et al., “Soft x-ray emission of laser-produced plasmas using a low-debris cryogenic nitrogen target,” J. App. Phys. 84(6):3419-3421 (1998).
Lebert et al., “A gas discharged based radiation source for EUV lithography,” Intl. Conf. Micro and Nano-Engineering 98 (Sep. 22-24, 1998) Leuven, Belgium.
Lebert et al., “Investigation of pinch plasmas with plasma parameters promising ASE,” Inst. Phys. Conf. Ser. No. 125: Section 9, pp. 411-415 (1992) Schiersee, Germany.
Lebert et al., “Comparison of laser produced and gas discharge based EUV sources for different applications,” Intl. Conf. Micro- and Nano-Engineering 98 (Sep. 22-24,

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