Photocopying – Projection printing and copying cameras – Distortion introducing or rectifying
Reexamination Certificate
2004-05-26
2008-03-25
Kim, Peter B. (Department: 2851)
Photocopying
Projection printing and copying cameras
Distortion introducing or rectifying
C355S053000, C355S067000
Reexamination Certificate
active
07349065
ABSTRACT:
An exposure apparatus according to one aspect of the present invention includes an illumination optical system for illuminating, in a slit-shaped illumination area, a pattern of a reticle with a light from a light source, a projection optical system for projecting an image of the pattern onto a wafer, the projection optical system including a mirror, a detection system for detecting a positional offset of a light spot while the wafer is exposed with the image, and a drive unit for driving an optical element of the projection optical system, while the wafer is exposed with the image based on the positional offset detected by the detection system, wherein the detection system includes a light source for emitting a detection light beam, and a light-receiving device for receiving the light spot of the detection light beam via the projection optical system, and wherein the light source is located at a position substantially equivalent to the wafer, the light-receiving device is located at a position substantially equivalent to the reticle, and the light source emits the detection light beam from the outside of the image.
REFERENCES:
patent: 5142132 (1992-08-01), MacDonald et al.
patent: 5202748 (1993-04-01), MacDonald et al.
patent: 5635722 (1997-06-01), Wakamoto et al.
patent: 6359678 (2002-03-01), Ota
patent: 6480262 (2002-11-01), Tanaka et al.
patent: 2002/0006561 (2002-01-01), Taniguchi
patent: 2002/0041368 (2002-04-01), Ota et al.
patent: 2003/0002023 (2003-01-01), Bunau et al.
patent: 2003/0003383 (2003-01-01), Van Der Werf et al.
patent: 2003/0128344 (2003-07-01), Nishi
patent: 2004/0189963 (2004-09-01), Ohsaki
patent: 2005/0146703 (2005-07-01), Der Werf et al.
patent: 0 779 528 (1997-06-01), None
patent: 1 089 327 (2001-04-01), None
patent: 11-219900 (1999-08-01), None
patent: 2000-286191 (2000-10-01), None
patent: 2001-326160 (2001-11-01), None
patent: 2003-31490 (2003-01-01), None
patent: 2002-0096984 (2002-12-01), None
patent: 03/017004 (2003-02-01), None
English translation for Japanese Patent Application Laid-Open No. 2000-286191.
Patent Abstracts of Japan for JP 2001-326160.
Patent Abstracts of Japan for JP 2001-31490.
Korean Patent Office, Office Action dated Apr. 27, 2006 with English Translation.
EPO Search Report dated Mar. 29, 2006 for corresponding European patent application No. 04012646.8.
Kim Peter B.
Morgan & Finnegan , LLP
LandOfFree
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