Immersion exposure technique

Details Immersion exposure technique Immersion exposure technique

2007-06-08

2008-09-02

Kim, Peter B (Department: 2851)

Photocopying

Projection printing and copying cameras

With temperature or foreign particle control

C355S053000

Reexamination Certificate

active

07420651

ABSTRACT:
An exposure apparatus which exposes a substrate to a pattern of an original via a projection optical system, with a gap between the projection optical system and the substrate being filled with liquid. The apparatus includes a substrate stage, movable with respect to the projection optical system, which holds the substrate, a plate, movable with respect to the projection optical system, having a substantially flush surface with an exposed surface of the substrate held by the substrate stage, and an immersion unit configured to supply and to recover the liquid. Supply and recovery by the immersion unit are simultaneously executed while the plate opposes the projection optical system.

REFERENCES:
patent: 4509852 (1985-04-01), Tabarelli et al.
patent: 5332977 (1994-07-01), Fritsche et al.
patent: 5550633 (1996-08-01), Kamiya
patent: 5610683 (1997-03-01), Takahashi
patent: 6101952 (2000-08-01), Thornton et al.
patent: 6665046 (2003-12-01), Nogawa et al.
patent: 6734950 (2004-05-01), Nakano
patent: 6757048 (2004-06-01), Arakawa
patent: 6788477 (2004-09-01), Lin
patent: 6867844 (2005-03-01), Vogel et al.
patent: 6952253 (2005-10-01), Lof et al.
patent: 7268854 (2007-09-01), Nagasaka
patent: 2001/0028443 (2001-10-01), Yabu
patent: 2002/0020821 (2002-02-01), Van Santen et al.
patent: 2002/0057425 (2002-05-01), Nakano
patent: 2002/0122162 (2002-09-01), Nakauchi et al.
patent: 2004/0075895 (2004-04-01), Lin
patent: 2004/0109237 (2004-06-01), Epple et al.
patent: 2004/0207824 (2004-10-01), Lof et al.
patent: 2004/0211920 (2004-10-01), Derksen et al.
patent: 2004/0257544 (2004-12-01), Vogel et al.
patent: 2005/0168713 (2005-08-01), Vogel et al.
patent: 2005/0237504 (2005-10-01), Nagasaka et al.
patent: 2005/0259234 (2005-11-01), Hirukawa et al.
patent: 2005/0280791 (2005-12-01), Nagasaka et al.
patent: 2006/0023183 (2006-02-01), Novak et al.
patent: 2006/0023186 (2006-02-01), Binnard
patent: 2006/0028632 (2006-02-01), Hazelton et al.
patent: 2006/0033894 (2006-02-01), Binnard
patent: 2006/0077367 (2006-04-01), Kobayashi et al.
patent: 2006/0098178 (2006-05-01), Nagasaka et al.
patent: 2006/0114445 (2006-06-01), Ebihara
patent: 2006/0132736 (2006-06-01), Nagasaka et al.
patent: 2006/0146306 (2006-07-01), Nagasaka et al.
patent: 2006/0274293 (2006-12-01), Nagasaka et al.
patent: 2006/0274294 (2006-12-01), Nagasaka et al.
patent: 2007/0035710 (2007-02-01), Nagasaka et al.
patent: 2007/0064210 (2007-03-01), Kobayashi et al.
patent: 2007/0132968 (2007-06-01), Kobayashi et al.
patent: 1 571 698 (2003-12-01), None
patent: 63-20014 (1988-01-01), None
patent: 6-6248 (1994-01-01), None
patent: 6-124873 (1994-05-01), None
patent: 2001/527380 (2001-12-01), None
patent: 2004-207711 (2004-07-01), None
patent: 2005-012228 (2005-01-01), None
patent: 2005-109426 (2005-04-01), None
patent: 2005-277363 (2005-10-01), None
patent: WO 99/33691 (1999-07-01), None
patent: WO 99/49504 (1999-09-01), None
patent: WO 2004/090577 (2004-10-01), None
patent: WO 2004/092830 (2004-10-01), None
patent: WO 2004/114380 (2004-12-01), None
patent: WO 2005/053955 (2005-06-01), None
U.S. Appl. No. 60/462,786, filed Apr. 11, 2003, Novak et al.
U.S. Appl. No. 60/462,499, filed Apr. 11, 2003, Binnard.
Japanese Office Action dated Feb. 7, 2007, issued in corresponding Japanese patent application No. 2002/296302, with English translation.
U.S. Appl. No. 60/462,112, filed Apr. 10, 2003, Hazelton et al.

Affiliated with

Also associated with

Rating

Immersion exposure technique does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Immersion exposure technique, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Immersion exposure technique will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3966644