Process to optimize properties of polymer pellicles and...

Stock material or miscellaneous articles – Composite – Of fluorinated addition polymer from unsaturated monomers

Reexamination Certificate

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C428S422000

Reexamination Certificate

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07314667

ABSTRACT:
Disclosed are pellicle compositions and methods of making such pellicle compositions. The pellicle compositions provided include highly fluorinated polymers as well as fluorinated polymer/PVDF co-polymers.

REFERENCES:
patent: 4060654 (1977-11-01), Quenneville
patent: 4296151 (1981-10-01), Boultinghouse
patent: 4737387 (1988-04-01), Yen
patent: 4743493 (1988-05-01), Sioshansi et al.
patent: 5041304 (1991-08-01), Kusano et al.
patent: 5378514 (1995-01-01), Hamada et al.
patent: 5643654 (1997-07-01), Fujita et al.
patent: 5693382 (1997-12-01), Hamada et al.
patent: 5723860 (1998-03-01), Hamada et al.
patent: 5880204 (1999-03-01), McCarthy et al.
patent: 5958524 (1999-09-01), Dehennau et al.
patent: 6055040 (2000-04-01), Sego
patent: 6083577 (2000-07-01), Nakagawa et al.
patent: 6111062 (2000-08-01), Shirota et al.
patent: 6300019 (2001-10-01), Ikeda et al.
patent: 6436586 (2002-08-01), Matsuoka et al.
patent: 6459491 (2002-10-01), Nguyen
patent: 6524754 (2003-02-01), Eynon
patent: 6548129 (2003-04-01), Matsukura et al.
patent: 6639650 (2003-10-01), Shirasaki
patent: 6652958 (2003-11-01), Tobita
patent: 6822731 (2004-11-01), Laganza et al.
patent: 6841312 (2005-01-01), Kalk
patent: 6842227 (2005-01-01), Shu
patent: 6842228 (2005-01-01), Shu
patent: 6869733 (2005-03-01), Su
patent: 2001/0004508 (2001-06-01), Shirasaki
patent: 2001/0014375 (2001-08-01), Tanaka
patent: 2002/0136965 (2002-09-01), Tsumoto et al.
patent: 2002/0179852 (2002-12-01), Zheng et al.
patent: 2003/0096178 (2003-05-01), Fujita et al.
patent: 2003/0187168 (2003-10-01), Sunaga et al.
patent: 2003/0192567 (2003-10-01), Koizumi et al.
patent: 2004/0123950 (2004-07-01), Boyd
patent: 2005/0045262 (2005-03-01), Eschbach et al.
patent: 2005/0048376 (2005-03-01), Eschbach et al.
patent: 2005/0202252 (2005-09-01), Tregub et al.
patent: 0 252 673 (1988-01-01), None
patent: 0 416 528 (1991-03-01), None
patent: 0 438 602 (1991-07-01), None
patent: 0 529 827 (1993-03-01), None
patent: 0 942 325 (1999-09-01), None
patent: 09-005982 (1997-01-01), None
patent: WO93/24559 (1993-12-01), None
patent: 2005/022259 (2005-03-01), None
K.R. Walton, “The Lubrication of Gold Surfaces by Plasma-Deposited Thin Films of Fluorocarbon Polymer,” IEE Transactions on Components, Hybrids, and Manufacturing Technology, v. CHMT- No. 2, 1980.
Karis et al., “Characterization of a Solid Fluorocarbon Film on Magnetic Recording Media,” J. Vac. Technol., A 15(4), 1997.
Karis et al., “Tribology of a Solid Flurocarbon Film on Magnetic Recording Media,” IEEE Transaction on Magnetics, V. 34, No. 4, 1998.
Theirich et al., “A Novel Technique for High rate Plasma Polymerization with Radio Frequency Plasmas,” Surface and Coating Technology 86-87, 1996.
P. Singer, “Atomic Layer Deposition Targets Thin Films,” Semiconductor International, Sep. 1, 1999.
Mark LaPedus “Nikon Evaluating 157-nm Lithography Options,” Semiconductor Business News, May 23, 2003.
Resrick & Bucks, “Teflon AF Amophous Flouropolymers.” Chapter 22 in Modern Fluoropolymers, Edited by J. Schews, Jon Wiley & Sons, 1997.
Sugiyama, “Perfluoropolymers Obtained by Cyclopolymerization and Their Applications,” Chapter 28 in Modern Fluoropolymers, Edited by J. Schews, Jon Wiley & Sons, 1997.
Seki et al., Phys. Suripta 41:167(1990)).
Chen, et al., “Pellicle-Induced Reticle Distortion: An Experimental Investigation”,Proc. of SPIE—The Int'l Soc. for Optical Engineering, vol. 3546, pp. 167-172 (1998).
Cotte, et al., “Effects of Soft Pellicle Frame Curvature and Mounting Process on Pellicle-Induced Distortions in Advanced Photomasks”,Proc. of SPIE—The Int'l Soc. for Optical Engineering, vol. 5040, pp. 1044-1054 (2003).
Cotte, et al., “Experimental and Numerical Studies of the Effects of Materials and Attachment Conditions on Pellicle-Induced Distortions in Advanced Photomasks”,Proc. of SPIE—The Int'l Soc. for Optical Engineering, vol. 4754, pp. 579-588 (2002).
Cotte, et al., “Numerical and Experimental Studies of Pellicle-Induced Photomask Distortions”,Proc. of SPIE—The Int'l Soc. for Optical Engineering, vol. 4562, pp. 641-651 (2002).
Kozeki, T., et al., “Longevity of 193nm/ArF Excimer Pellicle”, Mitsui Chemicals, Inc., Pellicle Dept., pp. 1-17 (2001).
Oshima, et al., “Chemical structure and physical properties of radiation-induced crosslinking of polytetrafluoroethylene”,Radiation Physics and Chemistry, vol. 62, pp. 39-45 (2001).
Reu, et al., “Mechanical analysis of hard pellicles for 157 nm lithography”,Proc. of the 2001 SPIE Symp. on Optical Microlithography XIV, vol. 4346, 9 pages (2001).
Shu, et al., “Hard Pellicle Study for 157-nm Lithography”,Preprint, to appear in the Proceedings of PhotomaskJapan, pp. 1-12 (2002).
Van Krevelen, D.W., with the collaboration of P.J. Hoftyzer,Properties of Polymers, Their Estimation and Correlation with Chemical Structure, Elsevier Scientific Publishing Company, Amsterdam—Oxford—New York, pp. 68-73 (1976).
Allinger, Norman, et al.,Organic Chemistry, Worth Publishers, Inc., 1971, p. 674.
Hawley's Condensed Chemical Dictionary, 13thEd., Revised by Richard J. Lewis, Sr., John Wiley & Sons, Inc., New York, NY, 1997, p. 297.
Webster's II New Riverside University Dictionary, Houghton Mifflin Company, 1988, p. 310.

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