Siloxane-based resin containing germanium and an interlayer...

Stock material or miscellaneous articles – Composite – Of silicon containing

Reexamination Certificate

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C528S035000

Reexamination Certificate

active

11710487

ABSTRACT:
A siloxane-based resin having germanium and an interlayer insulating film for a semiconductor device formed using the same. The siloxane-based resins have a low dielectric constant in addition to excellent mechanical properties so that they are useful materials for an insulating film between interconnecting layers of a semiconductor device.

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patent: 1 217 649 (2002-06-01), None
patent: WO 01/74957 (2001-11-01), None

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