Lithographic apparatus and device manufacturing method

Photocopying – Projection printing and copying cameras – Step and repeat

Reexamination Certificate

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C250S491100

Reexamination Certificate

active

10356727

ABSTRACT:
A lithographic projection apparatus includes an alignment sensor having an electron beam source constructed and arranged to provide an electron beam for impinging on an alignment marker on a substrate, and a back-scattered electron detector constructed and arranged to detect electrons back-scattered from the alignment marker. The alignment sensor is independent of the projection system and beam of radiation, and is an off-axis alignment sensor.

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patent: 4812661 (1989-03-01), Owen
patent: 5455427 (1995-10-01), Lepselter et al.
patent: 6331709 (2001-12-01), Amemiya et al.
patent: 6507034 (2003-01-01), Nakasugi
patent: 6765217 (2004-07-01), Nishimura et al.
patent: 1 150 173 (2001-10-01), None
patent: 63-263720 (1988-10-01), None
patent: 2001-85303 (2001-03-01), None

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