Stage alignment in lithography tools

Details Stage alignment in lithography tools Stage alignment in lithography tools

2008-05-27

2008-05-27

Connolly, Patrick J (Department: 2877)

Optics: measuring and testing

By light interference

For dimensional measurement

C356S401000

Reexamination Certificate

active

11029521

ABSTRACT:
In general, in a first aspect, the invention features a lithography system that includes a stage for supporting a wafer, an illumination system including a radiation source and a lens assembly, wherein the illumination system is configured to direct radiation through a mask to produce spatially patterned radiation, and the lens assembly is configured to image the spatially patterned radiation onto the wafer, a first interferometry system configured to monitor a location of the stage within the lithography system as the stage moves relative to the illumination system, a second interferometry system configured to identify an alignment feature on a surface associated with the stage, and an electronic controller coupled to the interferometry systems, wherein the electronic controller is configured to determine information about a location of the stage when the alignment feature is identified.

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