Projection exposure method and apparatus capable of performing f

Details Projection exposure method and apparatus capable of performing f Projection exposure method and apparatus capable of performing f

1995-08-30

1997-06-03

Le, Que

Radiant energy

Photocells; circuits and apparatus

Photocell controls its own optical systems

2505593, 356400, G01N 2186

Patent

active

056357222

ABSTRACT:
A projection exposure apparatus comprises a projection optical system for projecting a pattern of a mask on a photosensitive substrate, a stage, for holding the photosensitive substrate, movable in an optical-axis direction of the projection optical system and in a direction perpendicular to the optical axis, a position detection system for outputting a detection signal corresponding to a deviation of the projection optical system in the optical-axis direction between an imaging plane of the projection optical system and the surface of the photosensitive substrate by projecting a beam of light assuming a predetermined shape on the photosensitive substrate and, at the same time, photoelectrically detecting the reflected light from the photosensitive substrate, a fiducial member provided on the stage and having a fiducial pattern assuming a predetermined shape, and a device for detecting an irradiation position of the light beam within a plane perpendicular to the optical axis of the projection optical system on the basis of variations in intensity of a detection signal outputted from the position detection system when the fiducial pattern and the light beam are relatively moved in the predetermined direction perpendicular to the optical axis of the projection optical system.

REFERENCES:
patent: 4558949 (1985-12-01), Uehara et al.
patent: 4780617 (1988-10-01), Umatate et al.
patent: 4833621 (1989-05-01), Umatate
patent: 4853745 (1989-08-01), Kamiya et al.
patent: 5241188 (1993-08-01), Mizutani

Affiliated with

Also associated with

Rating

Projection exposure method and apparatus capable of performing f does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Projection exposure method and apparatus capable of performing f, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Projection exposure method and apparatus capable of performing f will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-393255