Apparatus and method for forming alignment layer

Details Apparatus and method for forming alignment layer Apparatus and method for forming alignment layer

2008-07-15

2008-07-15

Caley, Michael H (Department: 2871)

Liquid crystal cells, elements and systems

Nominal manufacturing methods or post manufacturing...

C349S124000

Reexamination Certificate

active

11342178

ABSTRACT:
It is an object of the present invention to provide an apparatus and a method for forming an alignment layer to align the orientation direction of liquid crystals. In an apparatus10for forming an alignment layer according to the present invention, the shape of an edge32aof a mask12for forming a slit14is determined by integrating the orientation direction of liquid crystals. The liquid crystals can be uniformly oriented by the edge32ahaving such shape. This leads to the manufacturing of a liquid crystal display free from irregularity in brightness and color.

REFERENCES:
patent: 5486403 (1996-01-01), Ishitaka et al.
patent: 5567550 (1996-10-01), Smayling
patent: 5770826 (1998-06-01), Chaudhari et al.
patent: 6061114 (2000-05-01), Callegari et al.
patent: 6061115 (2000-05-01), Samant et al.
patent: 6124914 (2000-09-01), Chaudhari et al.
patent: 6313896 (2001-11-01), Samant et al.
patent: 6331381 (2001-12-01), Chaudhari et al.
patent: 6377326 (2002-04-01), Kuo et al.
patent: 6479218 (2002-11-01), Choi
patent: 2002/0001057 (2002-01-01), Chaudhari et al.
patent: 07-056172 (1995-03-01), None
patent: 09-244027 (1997-09-01), None
patent: 10-253962 (1998-09-01), None
patent: 11-160711 (1999-06-01), None

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