Source multiplexing in lithography

Details Source multiplexing in lithography Source multiplexing in lithography

2008-05-13

2008-05-13

Vanore, David (Department: 2881)

Radiant energy

Irradiation of objects or material

C250S492220, C250S50400H

Reexamination Certificate

active

11196231

ABSTRACT:
An illumination system for an extreme ultraviolet (EUV) lithography system may include multiple sources of EUV light. The system may combine the light from the multiple sources when illuminating a mask.

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