Projection exposure apparatus

Details Projection exposure apparatus Projection exposure apparatus

1988-06-24

1990-12-11

Hix, L. T.

Photocopying

Projection printing and copying cameras

Step and repeat

355 67, G03B 2742, G03B 2754

Patent

active

049774263

ABSTRACT:
A projection exposure apparatus for projecting, through a refracting optical system, a pattern formed on an original such as a mask or reticle onto a wafer. The projection exposure apparatus includes a light source for providing an excimer laser beam to illuminate the original. The refracting optical system includes a plurality of lenses each of which is made of fused silica (SiO.sub.2) or calcium fluoride (CaF.sub.2).

REFERENCES:
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patent: 4132479 (1979-01-01), Dubroeucq et al.
patent: 4461546 (1984-07-01), Muffoletto et al.
patent: 4493555 (1985-01-01), Reynolds
patent: 4703166 (1987-10-01), Bruning
patent: 4811055 (1989-03-01), Hirose
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Buckley, "Expanding the Horizons of Optical Projection Lithography," Solid State Technology, pp. 77-82, 1982.
Attainment of the Theoretical Minimum Input Power of Injection Locking of an Unstable-Resonator KrF Laser, (Bigio et al.), "Optics Letters", vol. 6, No. 7, pp. 336-338 (1981).
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