Method and apparatus for inspecting pattern defects

Details Method and apparatus for inspecting pattern defects Method and apparatus for inspecting pattern defects

2008-04-15

2008-04-15

Lauchman, Layla G. (Department: 2877)

Optics: measuring and testing

Inspection of flaws or impurities

Surface condition

C356S237200, C356S237500, C356S328000, C250S559400

Reexamination Certificate

active

11180536

ABSTRACT:
A method of inspecting pattern defects can detect target defects in various processes stably by reducing erroneous detection of grains and morphology and decreasing the influence of an intensity nonuniformity in interference light. For this purpose, lights emitted from two sources of illumination capable of outputting a plurality of wavelengths are reflected by a beam splitter and irradiated onto a wafer. Diffracted light from the wafer is converged by an objective lens, is made to pass through light modulation units and imaged on an image sensor in a light detection unit. Then, defects are detected in a signal processing unit. Further, the optical modulation unit is made to have a structure that uses a plurality of optical components selectively and which can be optimized according to target defects.

REFERENCES:
patent: 5936726 (1999-08-01), Takeda et al.
patent: 6411377 (2002-06-01), Noguchi et al.
patent: 6825930 (2004-11-01), Cronin et al.
patent: 2005/0110988 (2005-05-01), Nishiyama et al.
patent: 61-212708 (1986-09-01), None
patent: 07-318326 (1995-12-01), None
patent: 08-320294 (1996-12-01), None
patent: 10-078668 (1998-03-01), None
patent: 2000-155099 (2000-06-01), None
patent: 2001-194323 (2001-07-01), None
patent: 2002-277404 (2002-09-01), None
patent: 2003-130808 (2003-05-01), None

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