Inspection device and inspection method for active matrix...

Electricity: measuring and testing – Impedance – admittance or other quantities representative of... – Lumped type parameters

Reexamination Certificate

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Reexamination Certificate

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11515985

ABSTRACT:
An inspection method includes an array process of forming a TFT array on a substrate to fabricate an active matrix panel, an inspection process of carrying out a performance test on the fabricated active matrix panel, and a cell process of mounting an OLED on the active matrix panel after the inspection process. In the inspection process, variation in parasitic capacitance through a pixel electrode is measured when driving TFTs constituting the active matrix fabricated in the array process are turned on and when the driving TFTs are turned off, and open/short defects in the driving TFTs are thereby inspected.

REFERENCES:
patent: 5179345 (1993-01-01), Jenkins et al.
patent: 5428300 (1995-06-01), Takahashi et al.
patent: 6693388 (2004-02-01), Oomura
patent: 6815975 (2004-11-01), Nara et al.
patent: 6930505 (2005-08-01), Taguchi et al.

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