Cleaning solution for semiconductor substrate

Details Cleaning solution for semiconductor substrate Cleaning solution for semiconductor substrate

2007-12-25

2007-12-25

Mruk, Brian (Department: 1751)

Cleaning compositions for solid surfaces, auxiliary compositions

Cleaning compositions or processes of preparing

For cleaning a specific substrate or removing a specific...

C510S176000, C510S258000, C510S272000, C510S273000, C510S413000, C510S421000, C510S434000, C510S435000, C510S475000

Reexamination Certificate

active

10750971

ABSTRACT:
A cleaning solution for semiconductor substrates comprising a nonionic surface active agent of the formula (1) and/or the formula (2), a chelating agent and a chelating accelerator:in-line-formulae description="In-line Formulae" end="lead"?CH3—(CH2)l—O—(CmH2mO)n—X   (1)in-line-formulae description="In-line Formulae" end="tail"?wherein l, m and n independently represent a positive number, and X represents a hydrogen atom or a hydrocarbon group;in-line-formulae description="In-line Formulae" end="lead"?CH3—(CH2)a—O—(CbH2bO)d—(CxH2xO)y—X   (2)in-line-formulae description="In-line Formulae" end="tail"?wherein a, b, d, x and y independently represent a positive number, b and x are different, and X represents a hydrogen atom or a hydrocarbon group.

REFERENCES:
patent: 2003/0144163 (2003-07-01), Morinaga et al.
patent: 2004/0142835 (2004-07-01), Takashima
patent: 2001-217215 (2001-08-01), None
patent: 2002-270566 (2002-09-01), None
patent: 2003-289060 (2003-10-01), None

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