Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mechanically forming pattern into a resist
Reexamination Certificate
2007-08-28
2007-08-28
Olsen, Allan (Department: 1763)
Etching a substrate: processes
Masking of a substrate using material resistant to an etchant
Mechanically forming pattern into a resist
Reexamination Certificate
active
10687562
ABSTRACT:
The present invention comprises a method for applying a liquid, such as imprinting material, to a substrate that features use of an electromagnetic field to rapidly spread the liquid over a desired portion of the substrate, while confining the same to the desired region.
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Cherala Anshuman
Schumaker Norman E.
Sreenivasan Sidlgata V.
Fish & Richardson P.C.
Kordzik Kelly K.
Molecular Imprints, Inc.
Olsen Allan
The University of Texas System & Board of Regents
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