Halftone phase shift mask blank, and method of manufacture

Details Halftone phase shift mask blank, and method of manufacture Halftone phase shift mask blank, and method of manufacture

2007-02-20

2007-02-20

McNeil, Jennifer C. (Department: 1775)

Stock material or miscellaneous articles

Composite

Of inorganic material

C430S005000, C204S192100

Reexamination Certificate

active

10679264

ABSTRACT:
A halftone phase shift mask blank has a phase shifter film on a transparent substrate. The phase shifter film is composed of a metal silicide compound containing Mo, at least one metal selected from Ta, Zr, Cr and W, and at least one element selected from O, N and C. The halftone phase shift mask blank has improved processability and high resistance to chemicals, especially to alkaline chemicals.

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Yoshioka et al., “An attentuated phase-shifting mask with a single-layer absorptive shifter”, Mitsubishi Denki Giho, 1995, Japan, vol. 69, No. 3, pp. 67-71 (XP008030088).

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