Ultraviolet light source, laser treatment apparatus...

Optical: systems and elements – Optical amplifier

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C359S326000, C355S067000, C355S069000

Reexamination Certificate

active

11148428

ABSTRACT:
An ultraviolet light source (1) comprises a laser light source (10) for generating a signal light in the infrared region, a optical amplifier (20) which comprises fiber optical amplifiers (21, 22) and amplifies the signal light generated by the laser light source (10), and a wavelength converting optical system (30) which coverts the signal light amplified by the light amplifier (20) into an ultraviolet light and outputs the converted light. The ultraviolet light source (1) uses a single-mode fiber laser (26) as an excitation light source for at least the fiber optical amplifier (22) at one stage of the optical amplifier (20).

REFERENCES:
patent: 5694408 (1997-12-01), Bott et al.
patent: 5790722 (1998-08-01), Minden et al.
patent: 6434172 (2002-08-01), DiGiovanni et al.
patent: 6556343 (2003-04-01), Fludger et al.
patent: 6590698 (2003-07-01), Ohtsuki et al.
patent: 6894826 (2005-05-01), Doi
patent: 6947123 (2005-09-01), Ohtsuki
patent: 2002/0025097 (2002-02-01), Cooper et al.
patent: 2002/0163711 (2002-11-01), Masum-Thomas
patent: 2003/0025890 (2003-02-01), Nishinaga
patent: 2003/0065312 (2003-04-01), Owa et al.
patent: 2003/0072056 (2003-04-01), Ota
patent: 2003/0112835 (2003-06-01), Williams et al.
patent: 2004/0086004 (2004-05-01), Bonaccini et al.
patent: 2004/0160662 (2004-08-01), Doi
patent: 10-41571 (1998-02-01), None
patent: 11-14551 (1999-01-01), None
patent: 2000-200747 (2000-07-01), None
patent: 2001-66650 (2001-03-01), None
patent: 2001-353176 (2001-12-01), None
patent: WO 02/065597 (2002-08-01), None
“Efficient 193 nm Generation by Eighth Harmonics of Er<3+>-Doped Fiber Amplifier”, Kitano, H., et al., Lasers and Electro-optics, 2001 CLEO/PACIFIC RIM 2001. The 4th Pacific RIM Conference, Jul. 15-19, 2001, Piscataway, NJ, USA, IEEE, vol. 2, Jul. 15, 2001, pp. 394-395, paragraph 3; Fig. 1.
“158-MUJ Pulses From a Single Transverse-Mode, Large-Mode-Area Erbium”, Taverner, D. et al., Optics Letters, OSA, Optical Society of America, Washington, D.C., US vol. 22, No. 6, Mar. 15, 1997, pp. 378-380, XP000690331, ISSN: 0146-9592, p. 379, left-hand column, paragraph 1; Fig. 1.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Ultraviolet light source, laser treatment apparatus... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Ultraviolet light source, laser treatment apparatus..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Ultraviolet light source, laser treatment apparatus... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3891397

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.