Active solid-state devices (e.g. – transistors – solid-state diode – Non-single crystal – or recrystallized – semiconductor... – Amorphous semiconductor material
Reexamination Certificate
2007-08-21
2007-08-21
Ha, Nathan W. (Department: 2814)
Active solid-state devices (e.g., transistors, solid-state diode
Non-single crystal, or recrystallized, semiconductor...
Amorphous semiconductor material
Reexamination Certificate
active
11122429
ABSTRACT:
A vertical transfer charge-coupled device for vertically transferring signal charges, a horizontal transfer charge-coupled device for receiving and horizontally transferring the transferred signal charges, an unwanted electron eliminator, and a potential barrier between the horizontal transfer charge-coupled device and the unwanted electron eliminator are provided on a semiconductor substrate. The potential barrier includes a first n-type diffusion layer, a second n-type diffusion layer that is in contact with one end thereof, and a third n-type diffusion layer that is in contact with the other end. The second n-type diffusion layer and the third n-type diffusion layer have higher impurity concentrations than the first n-type diffusion layer. As a result, a solid-state imaging device is provided with which the ability of the unwanted electron eliminator to eliminate unwanted electrons is enhanced, without decreasing the size of the charge handled by the horizontal transfer charge-coupled device, allowing image output even with a large optical volume signal.
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Ha Nathan W.
Hamre Schumann Mueller & Larson P.C.
Matsushita Electric - Industrial Co., Ltd.
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