Exposure apparatus, and device manufacturing method

Details Exposure apparatus, and device manufacturing method Exposure apparatus, and device manufacturing method

2007-08-28

2007-08-28

Mathews, Alan (Department: 2851)

Photocopying

Projection printing and copying cameras

With temperature or foreign particle control

C355S067000, C362S373000

Reexamination Certificate

active

11233034

ABSTRACT:
An apparatus for exposing a wafer to light. The apparatus includes a light source unit having a light source for emitting light, a first cooling unit for cooling the light source unit, in which the first cooling unit has a gas flowpassage for a gas passing through the light source unit, a second cooling unit for cooling the gas, in which the second cooling unit has a first fluid flowpassage for a first fluid which is to be heat-exchanged with the gas in the gas flowpassage at a position downstream of the light source unit with respect to the flow of the gas, and a first temperature adjusting unit for adjusting the temperature of the first fluid. The first temperature adjusting unit has a second fluid flowpassage for a second fluid which is to be heat-exchanged with the first fluid in the first fluid flowpassage at a position upstream of the cooling unit with respect to the flow of the first fluid.

REFERENCES:
patent: 4690528 (1987-09-01), Tanimoto et al.
patent: 4704348 (1987-11-01), Koizumi et al.
patent: 6002987 (1999-12-01), Kamiya et al.
patent: 6224248 (2001-05-01), Chiba
patent: 2004/0182565 (2004-09-01), Nomoto
patent: 11-329951 (1999-11-01), None

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