Method of producing a reflective mask and method of...

Details Method of producing a reflective mask and method of... Method of producing a reflective mask and method of...

2007-11-13

2007-11-13

Rosasco, S. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

10802886

ABSTRACT:
This invention is a method of producing a reflective mask comprising a substrate, a reflective multilayer film formed on the substrate to reflect exposure light, and at least one layer formed on the reflective multilayer film to define a nonreflecting region for the exposure light. The method comprises the steps of: (a) patterning a layer formed on and adjacent to a topmost layer of the reflective multilayer film; and (b) removing a reaction product produced following patterning in the step (a) and deposited on an exposed surface of the reflective multilayer film which is exposed as a result of patterning in the step (a). The step (a) may be performed by the use of an oxygen-containing plasma process.

REFERENCES:
patent: 6586145 (2003-07-01), Yokoi et al.
patent: 2001/0051304 (2001-12-01), Stivers et al.
patent: 2002/0014403 (2002-02-01), Hoshino
patent: 2002/0045108 (2002-04-01), Lee et al.
patent: 1498936 (2005-01-01), None
patent: 8-213303 (1996-08-01), None
patent: 2002-122981 (2002-04-01), None
patent: 2002-319542 (2002-10-01), None

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