Projection optical system, exposure apparatus, and exposure...

Details Projection optical system, exposure apparatus, and exposure... Projection optical system, exposure apparatus, and exposure...

2007-12-25

2007-12-25

Berman, Jack I. (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C250S492300, C359S365000, C359S730000, C359S364000, C359S726000, C359S649000, C359S350000, C355S053000

Reexamination Certificate

active

11583916

ABSTRACT:
A catadioptric projection optical system for forming a reduced image of a first surface (R) on a second surface (W) is a relatively compact projection optical system having excellent imaging performance as well corrected for various aberrations, such as chromatic aberration and curvature of field, and being capable of securing a large effective image-side numerical aperture while suitably suppressing reflection loss on optical surfaces. The projection optical system comprises at least two reflecting mirrors (CM1, CM2), and a boundary lens (Lb) whose surface on the first surface side has a positive refracting power, and an optical path between the boundary lens and the second surface is filled with a medium (Lm) having a refractive index larger than 1.1. Every transmitting member and every reflecting member with a refracting power forming the projection optical system are arranged along a single optical axis (AX) and the projection optical system has an effective imaging area of a predetermined shape not including the optical axis.

REFERENCES:
patent: 4346164 (1982-08-01), Tabarelli et al.
patent: 6473243 (2002-10-01), Omura
patent: 6600608 (2003-07-01), Shafer et al.
patent: 6631036 (2003-10-01), Schuster
patent: 6636350 (2003-10-01), Shafer et al.
patent: 6829099 (2004-12-01), Kato et al.
patent: 6873476 (2005-03-01), Shafer
patent: 2002/0024741 (2002-02-01), Terasawa et al.
patent: 2003/0197922 (2003-10-01), Hudyma
patent: 2004/0130806 (2004-07-01), Takahashi
patent: 2004/0240047 (2004-12-01), Shafer et al.
patent: 2005/0036213 (2005-02-01), Mann et al.
patent: 2005/0190435 (2005-09-01), Shafer et al.
patent: 2006/0077366 (2006-04-01), Shafer et al.
patent: 1 069 448 (2001-01-01), None
patent: A 6-188169 (1994-07-01), None
patent: A 10-163099 (1998-06-01), None
patent: A 10-214783 (1998-08-01), None
patent: A 10-303114 (1998-11-01), None
patent: A 2000-505958 (2000-05-01), None
patent: A 2001-228401 (2001-08-01), None
patent: B2 3246615 (2001-11-01), None
patent: A 2002-208551 (2002-07-01), None
patent: A 2003-114387 (2003-04-01), None
patent: WO 98/28665 (1998-07-01), None
patent: WO 2004/019128 (2004-03-01), None
patent: WO 2005/015316 (2005-02-01), None
patent: WO 2005/015316 (2005-02-01), None
patent: WO 2005/098505 (2005-10-01), None
patent: WO 2006/005547 (2006-01-01), None
Switkes et al; “Resolution Enhancement of 157-nm Lithography by Liquid Immersion”; Massachusetts Institute of Technology; 7 pages.

Affiliated with

Also associated with

Rating

Projection optical system, exposure apparatus, and exposure... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Projection optical system, exposure apparatus, and exposure..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Projection optical system, exposure apparatus, and exposure... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3865214