Diamond film depositing apparatus using microwaves and plasma

Coating apparatus – Gas or vapor deposition – With treating means

Reexamination Certificate

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Details

C156S345360, C156S345410, C156S345420, C156S345460, C156S345490, C315S111210

Reexamination Certificate

active

10471216

ABSTRACT:
Disclosed herewith is a diamond film depositing apparatus using microwaves and plasma. The apparatus comprises a rectangular wave guide (125), a mode transition coupler (120), an antenna rod (130), a quartz bell jar (140), a workpiece holder (116), a microwave cavity resonator (112), a source gas inflow ring (160), a mechanical support cylinder (164), a cooling jacket (165), gas inflow and outflow conduits (172and174) and a vacuum seal (190). The microwave cavity resonator (112) has a cylindrical shape the diameter of which is decreased in a downward direction. The microwave cavity resonator (112) may have a hemispherical shape, the flat surface of which is oriented upward.

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patent: 5427827 (1995-06-01), Shing et al.
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patent: 5954882 (1999-09-01), Wild et al.
patent: 6343565 (2002-02-01), Hongoh
patent: 6543380 (2003-04-01), Sung-Spitzl
patent: 94/26952 (1994-11-01), None
International Search Report—PCT/KR01/00487; ISA/Austrian Patent Office, Date Completed: Jun. 18, 2001.

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