Methods for forming small contacts

Details Methods for forming small contacts Methods for forming small contacts

2007-02-27

2007-02-27

Goudreau, George A. (Department: 1763)

Semiconductor device manufacturing: process

Chemical etching

Vapor phase etching

C438S700000, C438S719000, C438S723000, C438S770000

Reexamination Certificate

active

10728909

ABSTRACT:
Methods are provided for forming contacts for a semiconductor device. The methods may include depositing various materials, such as polysilicon, nitride, oxide, and/or carbon materials, over the semiconductor device. The methods may also include forming a contact hole and filling the contact hole to form the contact for the semiconductor device.

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