Method of increasing the area of a useful layer of material...

Semiconductor device manufacturing: process – Bonding of plural semiconductor substrates

Reexamination Certificate

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C438S458000

Reexamination Certificate

active

10619596

ABSTRACT:
A method for transferring a first substrate to a second substrate. First and second front faces of first and second substrates, respectively, are molecularly bonded to each other to provide a composite structure. The first front face has a first outline, the second front face has a second outline, and a peripheral side of the second substrate substantially borders the second front face and is oriented generally perpendicularly with respect thereto. The second outline has dimensions larger than the first outline, such that during bonding at least a portion of the first outline is disposed within the second outline for minimizing the size of a peripheral region about the first front face within an overlapping area at which the front faces overlap, in which peripheral region the bonding between the faces is weak or absent. A useful layer from a donor substrate, the useful layer comprising one of the first or second substrate adjacent the bonded face thereof.

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M.K. Weldon et al., “Mechanism of Silicon Exfoliation by Hydrogen Implantation and He, Li and Si Co-implantation,” Proceedings 1997 IEEE International SOI Conference, Oct. 1997, pp. 124-125.

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