Substrate processing apparatus and air supply method in substrat

Details Substrate processing apparatus and air supply method in substrat Substrate processing apparatus and air supply method in substrat

Filed on

1996-11-21

Date issued

1998-08-11

Examiner

Edwards, Laura

Patent Class

Coating apparatus

SubClass

With means to centrifuge work

Other Related Categories

118 56, 118 62, 118 63, 118319, 118320, 118326, 427240, B05C 500

Type

Patent

Status

active

Patent number

057922594

Description

ABSTRACT:
A velocity adjusting plate is provided above a substrate processing part in the interior of a substrate processing apparatus which is isolated from the external air. Thus, a downflow which is formed by conditioned air in the interior of the apparatus is separated into downflows having high and low velocities to be supplied to the substrate processing part and the periphery of the substrate processing part respectively. Consequently, the former downflow has a velocity which is suitable for controlling the temperature-humidity on the substrate surface and preventing the substrate from adhesion of particles and fine grains of a processing solution scattered from the substrate, while the latter downflow is suppressed to the minimum velocity which is necessary for preventing dusts and particles from creeping up by dispersion. Thus, it is possible to reduce consumption of air which is adjusted in temperature-humidity while isolating the interior of the apparatus from the external air.

REFERENCES:
patent: 3380369 (1968-04-01), Allander
patent: 3776121 (1973-12-01), Truhan
patent: 4510176 (1985-04-01), Cuthbert et al.
patent: 4616594 (1986-10-01), Itho
patent: 5116250 (1992-05-01), Sago et al.
patent: 5472502 (1995-12-01), Batchelder
patent: 5565034 (1996-10-01), Nanba et al.
patent: 5634975 (1997-06-01), Josefsson

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