Plasma processing apparatus

Details Plasma processing apparatus Plasma processing apparatus

2007-06-26

2007-06-26

Hassanzadeh, Parviz (Department: 1763)

Coating apparatus

Gas or vapor deposition

With treating means

C156S345360, C156S345410, C156S345420, C156S345460, C156S345490

Reexamination Certificate

active

10768469

ABSTRACT:
In a plasma processing apparatus, microwaves being transmitted in a waveguide pass through a microwave transmitted window via first and second slot antennas provided in a magnetic field side, so as to form surface waves. Process gas in a chamber is excited by the surface waves so as to generate surface wave plasma. A substrate is processed by the plasma. Each first slot antenna is provided with an aperture, which has a curved or bent shape and whose longitudinal direction extends substantially to follow the lines of magnetic force of the microwaves. Each second slot antenna is provided with an aperture which has a rectangular shape.

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patent: 2002-329716 (2005-11-01), None

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