Conductive layer for biaxially oriented semiconductor film...

Stock material or miscellaneous articles – Composite – Of inorganic material

Reexamination Certificate

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C428S701000, C428S702000, C428S469000, C428S472000, C428S446000, C428S450000

Reexamination Certificate

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11245721

ABSTRACT:
A conductive layer for biaxially oriented semiconductor film growth and a thin film semiconductor structure such as, for example, a photodetector, a photovoltaic cell, or a light emitting diode (LED) that includes a crystallographically oriented semiconducting film disposed on the conductive layer. The thin film semiconductor structure includes: a substrate; a first electrode deposited on the substrate; and a semiconducting layer epitaxially deposited on the first electrode. The first electrode includes a template layer deposited on the substrate and a buffer layer epitaxially deposited on the template layer. The template layer includes a first metal nitride that is electrically conductive and has a rock salt crystal structure, and the buffer layer includes a second metal nitride that is electrically conductive. The semiconducting layer is epitaxially deposited on the buffer layer. A method of making such a thin film semiconductor structure is also described.

REFERENCES:
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patent: 6965128 (2005-11-01), Holm et al.
patent: 2005/0016867 (2005-01-01), Kreiskott et al.
patent: 2006/0115964 (2006-06-01), Findikoglu et al.
Huhne, et al., “Thin biaxially textured TiN flims on amorphous substrates prepared by ion-beam assisted pulsed laser deposition,” Appl. Phys. Lett., 85(14), Oct. 4, 2004.
Huhne et al., “Thin Biaxially Textured TiN Films on Amorphous Substrates Prepared by Ion-Beam Assisted Pulsed Laser Deposition,” Appl. Phys. Lett., vol. 85, No. 14, pp. 2744-2746, Oct. 4, 2004.
Findikoglu et al, “Near Single-Crystalline, High-Carrier-Mobility Silicon Thin Film on a Polycrystalline/Amorphous Substrate,” U.S. Appl. No. 11/001,461, filed Nov. 30, 2004.

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